Nanoimprint lithography

（重定向自Nanoimprint）

Nanoimprint proximity effect. Top: Array of depressions is more quickly filled at the edge than the center, resulting in less imprinting at the center of the array. Bottom: The wide space between two groups of protrusions tends to be filled slower than the narrow spaces between the protrusions, resulting in the formation of holes in the unpatterned area.

Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

单词	Nanoimprint
释义	Nanoimprint 英语百科 Nanoimprint lithography （重定向自Nanoimprint） Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
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