| 释义 |
plasma chemical vapor deposition
- 物理气相沉积wù lǐ qì xiàng chén jī
PVD (physical vapor deposition)
- 冻干血浆dòng gàn xuè jiāng
frozen dry blood plasma
- 血浆xuè jiāng
blood plasma; plasma; adtevak
- 化学药品huà xué yào pǐn
chemical, chemical medicine
- 等离子děng lí zǐ
plasma
- 自夸者zì kuā zhě
vapor
- 供状gòng zhuàng
deposition, written confession
- 危险化学品wēi xiǎn huà xué pǐn
hazardous chemical; dangerous chemical
- 水蒸气shuǐ zhēng qì
vapor, vapour
- 蒸气压zhēng qì yā
vapor tension
- 蒸气浴zhēng qì yù
vapor bath
- 等离子区děng lí zǐ qū
plasm, plasma
- 等离子体děng lí zǐ tǐ
plasma; plasm
- 溅射淀积jiàn shè diàn jī
sputter deposition
- 析出电位xī chū diàn wèi
deposition potential
- 质膜zhì mó
plasmalemma; plasmolemma; plasma membranes
- 精细化工jīng xì huà gōng
industry of fine chemicals; fine chemical engineering
- 汽油蒸气qì yóu zhēng qì
fuel vapor
- 化工原理huà gōng yuán lǐ
principles of chemical engineering; principles of chemical industry
- 氩等离子体yà děng lí zǐ tǐ
argon plasma
- 化工厂huà gōng chǎng
chemical plant
- 化学键huà xué jiàn
chemical bond
- 化学用的huà xué yòng de
chemical
- 淀积层成分diàn jī céng chéng fèn
deposition composition
- 饱和蒸汽bǎo hé zhēng qì
saturated steam; saturated vapor
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