反应离子刻蚀 Reactive-ion etching
（重定向自Reactive ion etching）
反应离子刻蚀（英文：Reactive-Ion Etching，或简写为RIE）是一种半导体生产加工工艺，它利用由等离子体强化后的反应离子气体轰击目标材料，来达到刻蚀的目的。气体在低压（真空)环境下由电磁场产生，等离子体中的高能离子轰击芯片表面并与之反应。
Reactive ion etching
中文百科
英语百科
Reactive-ion etching 反应离子刻蚀
（重定向自Reactive ion etching）
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.
- Statistical Data Interpretations的意思
- statistical data processing的意思
- statistical data recorder的意思
- statistical date的意思
- statistical decision的意思
- statistical decision function的意思
- statistical decision making theory的意思
- statistical decision method的意思
- statistical decision problem的意思
- statistical decision procedure的意思
- statistical decision process的意思
- statistical decision rule的意思
- Statistical decision theory的意思
- statistical decomposition的意思
- statistical degrees of freedom的意思
- statistical demand analysis的意思
- statistical demand function的意思
- statistical department的意思
- Statistical dependence的意思
- statistical descriminant technique的意思
- Statistical description的意思
- statistical design的意思
- statistical design of experiments的意思
- statistical design value的意思
- statistical detector的意思